HiPIMS – High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering (HiPIMS), also known as High Power Pulse Magnetron Sputtering (HPPMS) is a novel pulse plasma technology for coating applications. New developments in DC pulse power controllers allow very high peak power pulses. Combining DC power or medium frequency (MF) pulse power to HPPMS / HiPIMS processes offers significant advantages in the plasma and surface technologies.

This technology is appropriate for single and dual magnetron applications and synchronized pulsed bias. It allows higher process rates for metallic and reactive sputtering applications. Processes, such as Co-Sputtering with different target materials using dual magnetron systems and asymmetric bipolar pulse modes are possible. Applicable HPPMS / HiPIMS Pulse packages with superimposed DC or MF sputtering open new fields of applications.

Application HiPIMS + DC  |  Application HiPIMS + MF

HiPIMS Coating Applications

  • TCO
  • Optical
  • Sensors
  • Isolation
  • M-A-X
  • DLC
  • Tribological

HiPIMS Single Magnetron Application

  • Unipolar positive and negative possible
  • Application for planar and rotatable magnetron
  • Large area coating

HiPIMS Dual Magnetron

  • Bipolar pulses in symetric and asymetric mode possible
  • Application for planar and rotatable magnetron
  • Large area coating