The HiPIMS + Bias application is a single or dual magnetron application using a conductive substrate. This application allows a variation of processes and high performances of thin film via improved micro-structure.

The special feature of this HiPIMS + Bias application is the MELEC DC-Pulse-Controller. It can synchronize and control all pulses in length and also by a phase shift trigger.

Advantages

  • Single or dual Magnetron applications
  • Synchronize phase shift bias pulses in ┬Ás steps
  • Separation of metal and gas ions

HiPIMS + BIAS

Example Applications

  • Hard and decorative coating
  • Single or dual magnetron systems