Applications

/Applications

The Concept

Introduction MELEC’s DC-Pulse Power Controller is developed to provide the most flexible and stable DC Pulse Controller for Plasma Surface Engineering [...]

HiPIMS

HiPIMS – High Power Impulse Magnetron Sputtering High Power Impulse Magnetron Sputtering (HiPIMS), also known as High Power Pulse Magnetron Sputtering [...]

HiPIMS + DC

HiPIMS processes are known for increasing the ionization rate of the sputtered species, thus enabling the magnetron sputtering technology with a [...]

HiPIMS + Bias

The HiPIMS + Bias application is a single or dual magnetron application using a conductive substrate. This application allows a variation [...]

HiPIMS + MF

The HiPIMS + MF application superimpose a HiPIMS pulse with a synchronized MF pulse during the off time of the HiPIMS [...]

HiPIMS + MF + Bias

The HiPIMS + MF + Bias application superimposes a HiPIMS pulse with a synchronized MF pulse during the off time of [...]